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Anglický jazyk
Advanced Lithography
Autor: Burton Kohler
This book presents state-of-the-art information regarding the extensive field of advanced lithography. Advanced lithography expands into numerous sub-fields like micro electro-mechanical system (MEMS), nano-lithography, nano-physics, etc. In optimized electron... Viac o knihe
Na objednávku
129.33 €
bežná cena: 143.70 €
O knihe
This book presents state-of-the-art information regarding the extensive field of advanced lithography. Advanced lithography expands into numerous sub-fields like micro electro-mechanical system (MEMS), nano-lithography, nano-physics, etc. In optimized electron device, nano-lithography reaches up to 20 nm in size. Subsequently, we have to analyze and develop true single nanometer size lithography. One of the solutions is to analyze a fusion of bottom up and top down technologies like EB drawing and self-assembly with block copolymer. In nano-photonics and MEMS, 3D structures are required for carrying out specific functions in the devices for applications. They are formed as a result of execution of numerous techniques like stereo-lithography, sputtering, colloid lithography, deposition, dry etching, etc. This book provides the readers with valuable information about nano structure, 3D structure, nano-lithography, and elucidates the methodology, techniques and applications of nano-lithography.
- Vydavateľstvo: ML Books International - IPS
- Rok vydania: 2015
- Formát: Hardback
- Rozmer: 235 x 157 mm
- Jazyk: Anglický jazyk
- ISBN: 9781632380166
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