-
Anglický jazyk
Investigations on Magnetron Sputtered Titanium based Oxide Films
Autor: Chandra Sekhar Musalikunta
The size reduction of Complementary Metal Oxide Semiconductor (CMOS) transistors requires replacement of conventional SiO2 layer with higher dielectric constant (k) material for gate dielectric, in order to reduce the gate leakage current and also to maximize... Viac o knihe
Na objednávku
66.60 €
bežná cena: 74.00 €
O knihe
The size reduction of Complementary Metal Oxide Semiconductor (CMOS) transistors requires replacement of conventional SiO2 layer with higher dielectric constant (k) material for gate dielectric, in order to reduce the gate leakage current and also to maximize gate capacitance. Among the many possible transition- metal oxide materials, titanium dioxide (TiO2) is a potential candidate because of its high energy band gap, refractive index and dielectric constant.
- Vydavateľstvo: LAP LAMBERT Academic Publishing
- Rok vydania: 2016
- Formát: Paperback
- Rozmer: 220 x 150 mm
- Jazyk: Anglický jazyk
- ISBN: 9783659874819
Nemecký jazyk 