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Anglický jazyk
Performance-Aware Stress Engineering for Nano-scaled FETs
Autor: Kunal Sinha
In the last couple of decades, the elastic strain engineering approach in nano-scaled silicon devices has been successfully implemented for different applications. Now a days, researchers are trying to incorporate such strain in different other materials... Viac o knihe
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O knihe
In the last couple of decades, the elastic strain engineering approach in nano-scaled silicon devices has been successfully implemented for different applications. Now a days, researchers are trying to incorporate such strain in different other materials such as Ge, GaAs, InGaAs, MoS2 etc. However, there are still some interesting areas remaining to extract further advantages of such strain technologies, which can be exploited for development of high performance CMOS devices and circuits, keeping the manufacturing cost and time under control.
- Vydavateľstvo: LAP LAMBERT Academic Publishing
- Rok vydania: 2019
- Formát: Paperback
- Rozmer: 220 x 150 mm
- Jazyk: Anglický jazyk
- ISBN: 9786139585441
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