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Anglický jazyk
Machine Learning-Based Modelling in Atomic Layer Deposition Processes
Autor: Oluwatobi Adeleke
This book describes the application of machine learning modelling approaches in atomic layer deposition and presents detailed information on modelling, optimization, and prediction of the behaviour and characteristics of ALD for improved process quality... Viac o knihe
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208.26 €
bežná cena: 231.40 €
O knihe
This book describes the application of machine learning modelling approaches in atomic layer deposition and presents detailed information on modelling, optimization, and prediction of the behaviour and characteristics of ALD for improved process quality control.
- Vydavateľstvo: CRC Press
- Rok vydania: 2023
- Formát: Hardback
- Rozmer: 240 x 161 mm
- Jazyk: Anglický jazyk
- ISBN: 9781032386706
Nemecký jazyk 
